Membership Eligibility
QNFCF is dedicated to advanced research and is open to internal (UWaterloo-affiliated) and external (non-UWaterloo) researchers from academia, government and industry
Level A Member
Graduate Students & Post-Docs:
Access to the QNFCF is limited to UWaterloo-affiliated and non-UWaterloo graduate students and Post-Doctoral researchers, as well as scientists & engineers with government and industry affiliations.
Level B Member
Undergrads with 8-month URA's & Co-op students on 8-month term:
In the case of undergraduate students who have been granted an Undergraduate Research Assistantship (URA) or similar, or in the case of Co-op students hired on an 8-month work term, the QNFCF appreciates the mutual benefit to both supervisor and student in gaining facility access for durations of 8 months (minimum) or more.
Consequently, applications for access from URA students (or similar) and 8-month Co-op students will be accepted provided the following conditions are respected at all times:
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Graduate students and Post-Docs have priority over URA & Co-op students for system access and training requests.
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URA & Co-op students must meet all usual access requirements.
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Prior to taking equipement-specific qualification tests and gaining independent access to said systems, URA & Co-op students must first shadow (partner with) a qualified peer for a few sessions. Systems cannot be directly operated by trainees during these sessions.
Level C Member
Co-op students with 4-month work term:
UWaterloo undergraduate students hired on a 4-month work term Co-op basis may be granted limited facility access. In all cases, the following conditions will apply:
- Student must not book more than one hour/day per qualified piece of equipment.
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Management reserves the right to revoke access at any time should the student's proficiency level be deemed inadequate during or post training.
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Student must be under the supervision of a UW faculty member whom is an existing member of the QNFCF community.
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The conditions listed above for Level B Members must be respected at all times.
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Student must be accompanied by Level A Member at all times when in the facility.
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Training on and access to will be limited to the following equipment:
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Characterization:
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thin film measurement (Filmetrics systems only)
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microscopes
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Wet Benches:
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Develop/Solvent Wetbench ONLY
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Lithography:
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HMDS Oven
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Spin coaters (pieces & wafers)
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Dry Etch:
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O2 plasma photoresist stripper
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Oxford Si Etch
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Oxford III-V & metals Etch
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Deposition:
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Oxford ALD/PECVD Cluster
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