General Info

Summary of system capabilities

Vendor: Reynoldstech
Model: Custom
Purpose: Removal of hardened photoresists & general substrate cleans


  1. Material restrictions in effect: click here
  2. Training required prior to use: click here
  3. More info for lab members: Manuals and Processes
  4. Buddy System policy applies to this equipment
  5. This equipment is exempt from 24/7 access for advanced users.
The Reynoldstech Piranha Organics Clean & Resist Strip wetbench is dedicated to the removal of hardened photoresists and general cleaning of wafers via the use of so-called piranha solutions composed of a mixture of sulfuric acid and hydrogen peroxide. This wetbench is equipped with one heated quartz tanks and an automated QDR/Cascade rinse tank. This bench is also equipped with a sink and an aspirator for cleanup.

Available Options

  • DI water and nitrogen spray guns
  • Temperature-controlled quartz bath
  • Automated spin rinser/dryers (adjacent to hood) for post-process rinsing & drying of batches of up to 24 wafers at once