General Info

Summary of system capabilities

Vendor:   Reynoldstech
Model:     Custom
Purpose:  Bulk wet silicon oxide etch via solutions of HF


  1. Material restrictions in effect: click here
  2. Training required prior to use: click here
  3. More info for lab members: Manuals and Processes
  4. Buddy System policy applies to this equipment.
Wet bench dedicated to Hydrofluoric (HF) acid-based processes and cleans. Only HF and HF-based etchants are permitted on this bench due to the severe hazard they pose.
Use of unauthorized chemicals on this bench will not be tolerated and will result in immediate suspension of access privileges.

Available Options

  • Foot-pedal actuated DI water gooseneck
  • DI water spray rinse basket
  • DI water and nitrogen spray guns
  • Temperature-controlled HF acid bath (to be activated after move to QNC building)
  • Drying rack