General Info

Summary of system capabilities

Vendor: Reynoldstech
Model: Custom
Purpose: Wafer clean via RCA chemistries


  1. Material restrictions in effect: click here
  2. Training required prior to use: click here
  3. More info for lab members: Manuals and Processes
  4. Buddy System policy applies to this equipment
  5. This equipment is exempt from 24/7 availability for advanced users
The Reynoldstech Diffusion pre-clean wetbench is dedicated to performing RCA cleaning of wafers and should always be employed prior to high temperature processing (thermal oxidation and LPCVD). This wetbench is equipped with two heated quartz tanks for the SC-1 and SC-2 solutions and a PVDF tank for optional intermediate HF dip. Automated wafer rinsing is accomplished through a QDR/Cascade rinse tank. This bench is also equipped with a sink and an aspirator for cleanup.

Available Options

  • DI water and nitrogen spray guns
  • Temperature-controlled quartz baths
  • Cascade-type DI water rinse tanks
  • Automated spin rinser/dryers (adjacent to hood) for post-process rinsing & drying of batches of up to 24 wafers at once