General Info

Summary of system capabilities

Vendor: Reynoldstech
Model: Custom
Purpose: Solvent-based processing of substrates

Important

  1. Material restrictions in effect: click here
  2. Training required prior to use: click here
  3. More info for lab members: Manuals and Processes
 
Wet bench dedicated to solvent-based processes for substrate cleaning, photoresist removal and lift-off processes. This bench is equipped with separate cupsinks for solvent and DI water disposal. The bench is also equipped with a cascade rinse for automated DI water rinsing of wafer samples.