General Info

Summary of system capabilities

Vendor: Mott
Model: Custom
Purpose: Solvent-based processing of substrates


  1. Material restrictions in effect: click here
  2. Training required prior to use: click here
  3. More info for lab members: Manuals and Processes
Wet bench dedicated to solvent-based processes for substrate cleaning, photoresist removal and lift-off processes. This bench is equipped with separate cupsinks for solvent and DI water disposal. The bench is also equipped with a cascade rinse for automated DI water rinsing of wafer samples.

Buddy System applies to this hood unless the permissible exceptions for Special Purpose Hoods noted here are satisfied. NO exceptions.

Use of this hood outside normally staffed hours is NOT permitted without prior written permission from Staff