General Info

Summary of system capabilities

Vendor:   Brewer Science
Model:     Custom enclosure with CEE 200X spinner and 1300X vacuum hotplate
Purpose:  Spin coating of E-beam photoresist films


  1. Material restrictions in effect: click here
  2. Training required prior to use: click here
  3. More info for lab members: Manuals and Processes


The Brewer E-beam resist spin coat station is intended for manual coating and baking of E-beam photoresist materials on substrates up to 8” diameter.  

The coating module features ports for manual application of resists.  The spin module incorporates a programmable exhaust setting and the option to bleed N2 into the spin chamber manually. Maximum rotational speed is 12000 RPM.  

The baking module is capable of programmed hard contact (vacuum), soft contact, or proximity baking modes at temperatures up to 300°C.