Authorized Materials

Summary of material constraints

Lab Members wishing to introduce new materials into this system must first obtain authorization from Fab Staff. New material requests must be initiated by submitting a Process Review Request online (form is only open to registered Lab Members).

Introducing unauthorized materials will result in suspension of member privileges

Authorized Substrates & Thin Films

Silicon
III-V semiconductor materials such as GaAs, InP, etc.
ZnSe (no substrate heating beyond 400^oC)
Glass
Quartz
Fused silica
Films of positive and negative optical and electron-beam photoresists (room temperature only)
Metal films: Al, Au, Cr, Ti, Ni, Ge, Pt, Fe, Nb, Ta
Films of Alumina and sapphire
Films of Silicon oxide and nitride
PZT (No heating permitted)

NOTE: Users may request target changes - click here

PROHIBITED Films

The possibility of introducing substrates coated with the following films has been studied. Our research has confirmed that the chamber contamination risk is too high. Therefore, these materials are NOT ALLOWED in this system:

In
Sb
Zn
Se
Tellurides: Bi₂Te₃, MoTe₂, etc