General Info

Summary of system capabilities

Model:     Amod
Purpose:  PVD of thin films via e-beam evaporation


  1. Material restrictions in effect: click here
  2. Training required prior to use: click here
  3. More info for lab members: Manuals and Processes

Available Options

  • 10 kV - 600mA E-beam gun
  • Rotating e-beam source with six crucibles
  • Variable height deposition stage with 150mm sample area and heating up to 300oC
  • Optional:  "lift off dome" structure to hold 6x 100mm samples
  • Primary and redundant QCM feedback
  • Advanced computer control of deposition parameters

Film Types Available

  • Ag
  • Al
  • Au
  • Cr
  • Cu
  • Ge
  • Ni
  • Pd
  • Pt
  • Ti
NOTE: due to crucible erosion issues depositions are limited to <3kA (rare exceptions granted on a case-by-case basis; consult with staff).

PROHIBITED depositions

The possibility of depositing the following films has been studied. Our research has concluded that the risk of chamber contamination is too high. Thus, these material depositions are NOT ALLOWED in this system:
  • Bi2Te3
  • Fe (films are allowed, deposition disallowed)
  • In
  • Sb
  • Se
  • Zn
  • Al2O3
  • CrO2
  • SiO and SiO2