General Info

Summary of system capabilities

Model:     PLD with In Situ RHEED
Purpose:  Precise thin film growth via Pulsed Laser Deposition


  1. Material restrictions in effect: click here
  2. Training is required prior to use: click here
  3. More info for lab members: Manuals and Processes

This system is capable of processing a single sample (wafer or piece) at a time, with maximum substrate size of 50mm diameter or smaller.

Gases currently available:

  • N2
  • O2
  • Pre-mix laser gas (0.12% F2,  3.03% Kr,  96.85% Ne) 

Additional Information:

  • This system is capable of operating at temperatures of up to 900oC.
  • Uncleaned, dirty samples and samples coated with polymeric films are strictly prohibited.  
  • All materials going into this system should specifically be listed in the authorized materials page.