General Info

Summary of system capabilities

Vendor: Angstrom Engineering Inc.
Model: Indium Series™ evaporator
Purpose: PVD of indium via resistive-heating thermal evaporation. 

Important

  1. Material restrictions in effect: click here
  2. Training required prior to use: click here
  3. More info for lab members: Manuals and Processes

Systems features and options

  • Ultimate base pressure of <1e-7 Torr
  • Water-cooled chamber walls and mid-height shield/collimation plate
  • Variable-height stage:
    • Source to substrate distance between 583 mm (23’’) and 685 mm (27’’)
    • 10 and 30 rpm rotation
    • Temperature-controlled with recirculating fluid between -30 and 125°C (stage temperature between -25 and 115 °C).
    • Generic sample holder for susbtrates up to 200 mm and two single-wafer holders  for 100 mm and 150 mm wafers.
  • ​​​​​​​​​​​​​Thermal evaporation source with 6 kVA transformer for deposition rate up to 100 Å/s
  • 12 quartz monitor crystals in one sensor head for continuous and accurate deposition
  • Source/substrate shutter
  • Shuttered viewport