Authorized Materials
Summary of material constraints
Lab members wishing to introduce new materials into this system must first obtain authorization from staff. New material requests must be initiated by submitting a Process Review Request form.
Non compliance will result in loss of member privileges
Authorized Chemicals
- Acetic acid
- Hydrochloric acid
- Nitric acid
- Phosphoric acid
- Sulfuric acid
- Ammonium hydroxide
- Hydrogen peroxide
Mixtures:
- RCA 1and 2
- HNA
- Dilute aqua regia (< 200 mL)
Commercial solutions:
- Al etchant type A and D
- Gold atchant TFA
- Nickel etchant
- Palladum etchant TFP
- Tantalum etchant 111
- Tungsten etchant TFW
- EKC265
- Dynastrip DL9150
Authorized Substrates
- silicon
- III-V semiconductor materials such as GaAs, InP, etc.
- glass
- quartz
- fused silica
Authorized Films
- silicon dioxide
- silicon nitride
- polysilicon/amorphous silicon
- aluminum
- titanium
- gold
- chrome
PROHIBITED Substrates & Films
- ZnSe
- Se
- Bi2Te3