Authorized Materials

Summary of material constraints

Lab members wishing to introduce new materials into this system must first obtain authorization from staff. New material requests must be initiated by submitting a Process Review Request form.

Non compliance will result in loss of member privileges

Substrate Dimensions

  • ALL substrates must be larger than 8 x 8 mm.
  • Substrate thickness less than 1 cm
  • Surface height variation less than 100 um
  • Maximum substrate size 200 x 200 mm, maximum exposable area 150 x 150 mm

Authorized Substrates

  • silicon
  • III-V semiconductor materials such as GaAs, InP, etc.
  • glass
  • quartz
  • fused silica
  • ZnSe

Authorized Films

  • all types of positive and negative photoresists, with a thickness < 50 um
  • all types of solid dielectric films such as silicon dioxide, silicon nitride, etc.
  • all types of solid conducting films such as chrome, aluminum, gold, titanium, etc.

PROHIBITED Films

  • Any film not specifically authorized above is NOT PERMITTED