General Info

Summary of system capabilities

Vendor:   Brewer Science
Model:     Custom enclosure with CEE 200X spinner and 1300X vacuum hotplate
Purpose:  Spin coating of photoresist films


  1. Material restrictions in effect: click here
  2. Training required prior to use: click here
  3. More info for lab members: Manuals and Processes


The Brewer photoresist spin coat station is intended for semi-automated coating and baking of photoresist materials on substrates up to 8” diameter.  

The coating module features automated syringe and cartridge dispensing options as well as ports for manual application of photoresists.  The spin module incorporates a programmable exhaust setting and edge bead removal features as well as the option to bleed N2 into the spin chamber manually.  Maximum rotational speed is 6000 RPM.  

The baking module is capable of programmed hard contact (vacuum), soft contact, or proximity baking modes at temperatures up to 300°C.