General Info

Summary of system capabilities

Vendor:   Reynoldstech (hood) & Headway Research (spin coaters)
Model:     Custom hood equipped with PMW32-PS spinners
Purpose:  Spin coating of various photoresist thin films


  1. Material restrictions in effect: click here
  2. Training required prior to use: click here
  3. More info for lab members: Manuals and Processes
Wet bench is equipped with two spin coat stations and hotplates. These are dedicated to UV & E-beam photoresist coating of substrates ranging in size from pieces to wafers of 1" to 6" diameter.