Authorized Materials

Summary of material constraints

Lab members wishing to introduce new materials into this system must first obtain authorization from staff. New material requests must be initiated by submitting a Process Review Request form.

Non compliance will result in loss of member privileges

Authorized Substrates

  • Silicon ONLY
  • NOTE: This tool is to be used STRICTLY for etching silicon. NO EXCEPTIONS.

Authorized Films

  • all types of positive and negative optical and electron-beam photoresists (PMMA, ZEP, HSQ, Polystyrene)
  • Al
  • Cr
  • Silicon Oxide
  • Silicon Nitride
  • Aluminum Oxide
  • Titanium Dioxide
  • if any other materials are present on your samples, CONTACT STAFF BEFORE PROCEEDING


Any material not specifically listed above is NOT ALLOWED in this system since the risk of chamber contamination has been deemed to be too high.

  • Any film not specifically authorized above is NOT PERMITTED (minor exception below)

Films which may be present but which must be fully masked (covered/encapsulated)

  • Thermal paste and Fomblin oil adhesives
  • Noble metals: Au, Pt
  • Magnetic metals: Ni