General Info

Summary of system capabilities

Vendor: Intlvac
Model: Nanochrome II
Purpose: PVD of thin films via e-beam & resistive-heating thermal evaporation


  1. Material restrictions in effect: click here
  2. Training required prior to use: click here
  3. More info for lab members: Manuals and Processes

Available Options

  • E-beam gun operating in the 6-10 kV range
  • Rotating e-beam source with four crucibles
  • Separate thermal evaporation source (via resistive heating)
  • Ion gun for assisted deposition
  • Heated chuck up to 775oC
  • Quartz heaters up to 400oC
  • Overnight (16hr pump down) base pressure of 1x10-7 Torr

Film Types Available

NOTE: due to crucible erosion issues depositions are limited to <3kA

  • Ag
  • Al
  • Al2O3
  • Au
  • Cr
  • Cu
  • Ge
  • Ni
  • Pd
  • Pt
  • SiO
  • Ti
  • Si

PROHIBITED depositions

The possibility of depositing the following films has been studied. Our research has concluded that the risk of chamber contamination is too high. Thus, these material depositions are NOT ALLOWED in this system:
  • Tellurides: Bi2Te3, MoTe2, etc
  • Alkali metal fluorides: LiF, KF, NaF, etc
  • Fe (films are allowed, deposition disallowed)
  • In
  • Sb
  • Se
  • Zn