General Info

Summary of system capabilities

Vendor:   Plassys
Model:     MEB 550 SL3-UHV
Purpose:  PVD of Aluminum via e-beam evaporation for Josephson Junction fabrication


  1. Material restrictions in effect: click here
  2. Training required prior to use: click here
  3. More info for lab members: Manuals and Process

Available Options

  • Loadlock with sample baking, UV-Ozone descum, and Ion Beam etching
  • Deposition chamber with sample tilting for Josephson Junction fabrication via resist shadow masking
  • Separate treatment chamber for oxidation (dynamic and static) and annealing of films
  • Telemark 6kW power supply 
  • UHV construction throughout
  • Sample baking up to 950oC in Oxidation/Anneal chamber
  • Cryopumped deposition chamber with base pressure < 2x10-9 Torr 

Film Types Available

  • Al

PROHIBITED depositions:

This system is dedicated strictly to the deposition of Aluminum films.  No other film types are permitted.