Authorized Materials

Summary of material constraints

Lab members wishing to introduce new materials into this system must first obtain authorization from staff. New material requests must be initiated by submitting a Process Review Request form.

Non compliance will result in loss of member privileges

Authorized Substrate Materials

  • Silicon
  • Sapphire
  • All other substrate types must be approved by staff

Authorized Films for non-annealed depositions

    • Films of positive and negative optical and electron-beam photoresists
    • SiO2
    • Si3N4
    • Al
    • Nb
    • NbN
    • Ti
    • TiN
    • Au (only for alignment marker purposes)
    • Pd (only for alignment marker purposes)
    • All films deposited in Plassys-sputter system
    • All other film types must be approved by Fab Staff

    Authorized Films for annealed depositions

      • NONE

      PROHIBITED Films

      The possibility of introducing substrates coated with the following films has been studied. Our research has confirmed that the chamber contamination risk is too high. Therefore, these materials are NOT ALLOWED in this system:
      • In
      • Sb
      • Fe
      • Ni
      • Cr
      • Co
      • Zn
      • Se
      • All films from Intlvac-Ebeam, AJA-sputter, or any outside of QNFCF deposition systems (except for alignment marker purposes)