Authorized Materials

Summary of material constraints

Lab members wishing to introduce new materials into this system must first obtain authorization from staff. New material requests must be initiated by submitting a Process Review Request form.

Non compliance will result in loss of member privileges

Authorized Substrates & Thin Films

  • Silicon
  • III-V semiconductor materials such as GaAs, InP, etc.
  • ZnSe (no substrate heating beyond 400C)
  • Glass
  • Quartz
  • Fused silica
  • Films of positive and negative optical and electron-beam photoresists
  • Metal films: Al, Au, Cr, Ti, Ni, Ge, Pt, Fe
  • Films of Alumina and sapphire
  • Films of Silicon oxide and nitride
  • PZT (No heating permitted)
  • Carbon tape

PROHIBITED Substrates & Films

The possibility of introducing substrates coated with the following films has been studied. Our research has confirmed that the risk of chamber contamination is too high. Thus, these materials are NOT ALLOWED in this system: